Diffusion Thin Film Sheet Resistance Analysis Module (JPV Structure Photovoltage Method)
for non-contact testing of samples with P/N or N/P structures for sheet resistance
CHARACTERISTICS
| Probe Range | 10-500Q/□ | ||
| Probe Performance | Dynamic Reproducibility | Static Reproducibility | Display Error |
| Testing Conditions: Sampling rate 50SPS (20ms), 20 points per cycle | |||
| 010-050Q/□<2% | <0.5% | ≤±3% | |
| 050-200Q/□<1% | <0.2% | ≤±3% | |
| 200-5002/□<0.6% | <0.15% | ≤±3% | |
| Dimensions | Probe: 60mm*30mm*100mm (LW*H) Control Box: 173*130*55mm | ||
| Signal Acquisition | Sampling Rate: up to 500SPS | ||
| Data Interface: RS232 RS485 CAN TCP/IP | |||
| Transmission Protocol: Modbus Rtu/Modbus Tcp, user-defined SOCKET protocol, etc. | |||
DESCRIPTION
- Primarily uses structure photovoltage technology for non-contact testing of samples with P/N or N/P structures for sheet resistance (emitter thin layer sheet resistance). This instrument is non-contact and non-destructive in testing, with advantages of high testing speed, good repeatability, and ability to directly test product slices.
